Thin-Film Engineering of Mechanical Fragmentation Properties of Atomic-Layer-Deposited Metal Oxides.

Mechanical fracture properties were studied for the common atomic-layer-deposited AlO, ZnO, TiO, ZrO, and YO thin films, and selected multilayer combinations via uniaxial tensile testing and Weibull statistics. The crack onset strains and interfacial shear strains were studied, and for crack onset strain, TiO/AlO and ZrO/AlO bilayer films exhibited the highest values. The films adhered well to the polyimide carrier substrates, as delamination of the films was not observed.