Radiation-Stimulated Formation of Two-Dimensional Structures Based on Calcium Silicide.

The formation of CaSi polycrystalline structures under the postgrowth electron irradiation of epitaxial CaF/Si(111) films with embedded thin Si layers was studied. The dependence on the electron exposure time was investigated for two types of structures with different film thicknesses. The optimal conditions for the formation of two-dimensional CaSi structures were found.