A comprehensive review on anticorrosive/antifouling superhydrophobic coatings: Fabrication, assessment, applications, challenges and future perspectives.

Superhydrophobicity (SHP) is an incredible phenomenon of extreme water repellency of surfaces ubiquitous in nature (E.g. lotus leaves, butterfly wings, taro leaves, mosquito eyes, water-strider legs, etc).

Understanding the structural and chemical changes in vertical graphene nanowalls upon plasma nitrogen ion implantation.

Shallow plasma ion implantation is a versatile method for nitrogen incorporation in vertical graphene nanowalls (VGNs). However, the defects introduced by the process and the preference of nitrogen to occupy various locations in the 2D layered structure make the characterization complex. We have simplified the analysis of 2 kV nitrogen plasma ion implanted VGNs by correlating the binding energy of N electrons with the chemical state of nitrogen as lone-pair localized (N1), lone-pair de-localized (N2) and quaternary nitrogen (N3).

Local crystal structure and mechanical properties of sputtered Ti-doped AlN thin films.

In this article, we predominantly report the investigation of the local crystal structure around a Ti dopant by X-ray absorption spectroscopy (XAS) and the nano-mechanical properties of co-sputtered Al1-xTixN (x = 0 to 4%) thin films. Grazing incidence X-ray diffraction (GIXRD) results show that these films are crystallized with the hexagonal wurtzite structure of AlN. Surface chemical analysis and morphology analysis of Al1-xTixN films are executed using X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) techniques, respectively.

Local crystal structure in the vicinity of Cr in doped AlN thin films studied by X-ray absorption spectroscopy.

This article reports the detailed X-ray absorption spectroscopy (XAS) study of Al1-xCrxN (x = 4, 6, 11%) thin films synthesized by the reactive magnetron co-sputtering technique. All these films were crystallized with a hexagonal wurtzite structure with preferential orientation along the a-axis without the formation of any secondary phases. Surface chemical analysis to evaluate the Cr concentration was carried out using X-ray photoelectron spectroscopy.

A comparative study on defect estimation using XPS and Raman spectroscopy in few layer nanographitic structures.

Defects in planar and vertically oriented nanographitic structures (NGSs) synthesized by plasma enhanced chemical vapor deposition (PECVD) have been investigated using Raman and X-ray photoelectron spectroscopy. While Raman spectra reveal the dominance of vacancy and boundary type defects respectively in vertical and planar NGSs, XPS provides additional information on vacancy related defect peaks in the C 1s spectrum, which originate from non-conjugated carbon atoms in the hexagonal lattice. Although an excellent correlation prevails between these two techniques, our results show that estimation of surface defects by XPS is more accurate than Raman analysis.