Optimizing Josephson Junction Reproducibility in 30 kV E-Beam Lithography: An Analysis of Backscattered Electron Distribution.

This paper explores methods to enhance the reproducibility of Josephson junctions, which are crucial elements in superconducting quantum technologies, when employing the Dolan technique in 30 kV e-beam processes. The study explores the influence of dose distribution along the bridge area on reproducibility, addressing challenges related to fabrication sensitivity. Experimental methods include e-beam lithography, with electron trajectory simulations shedding light on the behavior of backscattered electrons.

Large-scale assembly of single nanowires through capillary-assisted dielectrophoresis.

An innovative technique is proposed for the precise and scalable placement of 1D nanostructures in an affordable manner. This approach combines the dielectrophoresis phenomenon and capillary assembly to successfully align thousands of single nanowires at specific locations at the wafer. The nanowires are selectively trapped by taking advantage of the material--specific frequence dependence.