Publications by authors named "Nadine Pebere"

Correction for 'Insight at the atomic scale of corrosion inhibition: DFT study of 8-hydroxyquinoline on oxidized aluminum surfaces' by Fatah Chiter , , 2023, https://doi.org/10.1039/d2cp04626a.

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8-Hydroxyquinoline (8-HQ) is a promising organic molecule for the corrosion protection of aluminum and its alloys in the replacement of chromate salts. On the aluminum surface, the presence of an oxide layer naturally formed can influence the inhibition efficiency which depends on molecule-surface interactions. In the present study, we performed quantum chemical calculations on native 8-HQ, tautomer and 8-Q (deprotonated, H-abstracted or radical) molecules, adsorbed on an oxidized aluminum surface (γ-AlO(111)/Al(111)).

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8-Hydroxyquinoline (8HQ) is a new green corrosion inhibitor. DFT-D calculations are performed to investigate the adsorption of 8HQ and derivatives on the Al(111) surface from low to high coverage. From θ = 0.

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The 8-hydroxyquinoline (8-HQ) molecule is an efficient corrosion inhibitor for aluminum and is also used in organic electronic devices. In this paper, the adsorption modes of 8-HQ and its derivatives (tautomer, dehydrogenated and hydrogenated species) on the Al(111) surface are characterized using dispersion corrected density functional theory calculations. The 8-HQ molecule is physisorbed and is chemisorbed on the aluminum surface with similar adsorption energy (-0.

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Amorphous aluminium oxide coatings were processed by metalorganic chemical vapour deposition (MOCVD); their structural characteristics were determined as a function of the processing conditions, the process was modelled considering appropriate chemical kinetic schemes, and the properties of the obtained material were investigated and were correlated with the nanostructure of the coatings. With increasing processing temperature in the range 350 degrees C-700 degrees C, subatmospheric MOCVD of alumina from aluminium tri-isopropoxide (ATI) sequentially yields partially hydroxylated amorphous aluminium oxides, amorphous Al2O3 (415 degrees C-650 degrees C) and nanostructured gamma-Al2O3 films. A numerical model for the process allowed reproducing the non uniformity of deposition rate along the substrate zone due to the depletion of ATI.

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