Ultra-low threshold polariton lasing at room temperature in a GaN membrane microcavity with a zero-dimensional trap.

Polariton lasers are coherent light sources based on the condensation of exciton-polaritons in semiconductor microcavities, which occurs either in the kinetic or thermodynamic (Bose-Einstein) regime. Besides their fundamental interest, polariton lasers have the potential of extremely low operating thresholds. Here, we demonstrate ultra-low threshold polariton lasing at room temperature, using an all-dielectric, GaN membrane-based microcavity, with a spontaneously-formed zero-dimensional trap.

Highly uniform zinc blende GaAs nanowires on Si(111) using a controlled chemical oxide template.

GaAs-based nanowires (NWs) can be grown without extrinsic catalyst using the Ga-assisted vapor-liquid-solid method in an epitaxy reactor, on Si(111) substrates covered with native oxide. Despite its wide use, the conventional method fails to provide a good control over uniformity, reproducibility, and yield of vertical NWs. The nucleation of GaAs NWs is very sensitive to the properties of the native oxide such as chemical composition, roughness and porosity.

Strained GaAs/InGaAs Core-Shell Nanowires for Photovoltaic Applications.

We report on the successful growth of strained core-shell GaAs/InGaAs nanowires on Si (111) substrates by molecular beam epitaxy. The as-grown nanowires have a density in the order of 10(8) cm(-2), length between 3 and 3.5 μm, and diameter between 60 and 160 nm, depending on the shell growth duration.

Extraction of absorption coefficients from as-grown GaN nanowires on opaque substrates using all-optical method.

We demonstrate a new all-optical method to measure absorption coefficients in any family of as-grown nanowires, provided they are grown on a substrate having considerable difference in permittivity with the nanowire-air matrix. In the case of high crystal quality, strain-free GaN nanowires, grown on Si (111) substrates, the extracted absorption coefficients do not exhibit any enhancement compared to bulk GaN values, unlike relevant claims in the literature. This could be attributed to the relatively small diameters, short heights, and high densities of our nanowire arrays.

Effect of annealing on the properties of indium-tin-oxynitride films as ohmic contacts for gan-based optoelectronic devices.

Indium-tin-oxynitride (ITON) films have been fabricated by rf sputtering from an indium-tin-oxide target in nitrogen plasma. The influence of postdeposition annealing up to 800 degrees C is analyzed by electrical, optical, and surface characterization of the films in comparison to indium-tin-oxide (ITO) films fabricated in argon plasma. High-temperature annealing resulted in ITO(N) films with similar carrier concentrations.

A GaAs polariton light-emitting diode operating near room temperature.

The increasing ability to control light-matter interactions at the nanometre scale has improved the performance of semiconductor lasers in the past decade. The ultimate optimization is realized in semiconductor microcavities, in which strong coupling between quantum-well excitons and cavity photons gives rise to hybrid half-light/half-matter polariton quasiparticles. The unique properties of polaritons-such as stimulated scattering, parametric amplification, lasing, condensation and superfluidity-are believed to provide the basis for a new generation of polariton emitters and semiconductor lasers.

All-optical spatial light modulator with megahertz modulation rates.

We demonstrate a novel all-optical spatial light modulator capable of megahertz modulation rates. It is based on the quantum-confined Stark effect, but the modulating electric field is entirely photogenerated by strongly asymmetric photocarrier transfer in GaAs/AlAs layers. In a nonoptimized sample, cw optical excitation of approximately 50 W/cm(2) created a 30-kV/cm electric field, inducing a 9-meV exciton red shift at room temperature.