ZnCl-doped mesoporous silica nanoparticles prepared via a simple one-pot method for highly efficient nitrate removal.

Nitrate is a crucial nutrient in the natural nitrogen cycle. However, human activities have elevated nitrate levels in aquatic ecosystems beyond natural thresholds, posing risks to human health and the environment. In this work, ZnCl-doped mesoporous silica nanoparticles (ZnCl@MSN) were synthesized using a one-pot preparation method, leading to a streamlined process with reduced time and energy consumption.

A novel metal-free perylene-functionalized graphite adsorbent for efficient antibiotic removal from wastewater.

Adsorption remains a widely utilized and effective technique for removing chemical contaminants from polluted water, and novel adsorbents are currently in the process of being developed. The presence of antibiotics residues in aqueous effluents is a potential concern due to their potential adverse effects on living organisms. In this work, perylene tetracarboxylic acid-functionalized expanded graphite (PTCA-EG) was synthesized as a metal-free adsorbent and its potential for efficient treatment of contaminated wastewater with cefalexin (CLX) antibiotic was studied.

Highly efficient phosphate adsorption using calcium silicate hydrate-embedded calcium crosslinked polyvinyl alcohol thin film.

The removal of phosphate from water is necessary to avoid eutrophication. In this work, a novel composite film of calcium silicate hydrate (CSH) immobilized within calcium cross-linked polyvinyl alcohol (CSH-PVA) was developed for efficient phosphate removal from water using a simple and environmentally friendly preparation method. The characterization showed that flake crystal-like CSH nanoparticles were immobilized on a PVA film (86-106 μm).

XUV Absorption Spectroscopy and Photoconversion of a Tin-Oxo Cage Photoresist.

Extreme ultraviolet lithography has recently been introduced in high-volume production of integrated circuits for manufacturing the smallest features in high-end computer chips. Hybrid organic/inorganic materials are considered as the next generation of photoresists for this technology, but detailed knowledge about the response of such materials to the ionizing radiation used (13.5 nm, 92 eV) is still scarce.