Oxidation behavior of nanocomposite films is very important characteristics for application of machining and cutting tools. In this study, Ti-Al-Si-N-O nanocomposite films were fabricated onto WC-Co and Si wafer substrates. The composition of the Ti-Al-Si-N-O films was analyzed by X-ray photo-electron spectroscope (XPS).
View Article and Find Full Text PDFFunctional graded Ti-Al-Si-N-O nanocomposite films were deposited onto WC-Co substrate by a filtered arc ion plating system using TiAl and TiSi composite targets under N₂/Ar atmosphere. XRD and XPS analyses revealed that the synthesized Ti-Al-Si-N-O films were nanocomposite consisting of nanosized (Ti, Al, Si)N crystallites embedded in an amorphous Si₃N₄/SiO₂ matrix. The hardness of the Ti-Al-Si-N-O films exhibited the maximum hardness values of ~47 GPa at a Si content of ~5.
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