Lateral Carrier Diffusion in Ion-Implanted Ultra-Small Blue III-Nitride MicroLEDs.

Ultrasmall micro-light-emitting diodes (μLEDs), sized below 10 μm, are indispensable to create the next-generation augmented and virtual reality (AR/VR) devices. Their high brightness and low power consumption could not only enhance the user experience by providing vivid and lifelike visuals but also extend device longevity. However, a notable challenge emerges: a decrease in efficiency with a reduced size.

Bidirectional light-emitting diode as a visible light source driven by alternating current.

Gallium nitride-based light-emitting diodes have revolutionized the lighting market by becoming the most energy-efficient light sources. However, the power grid, in example electricity delivery system, is built based on alternating current, which raises problems for directly driving light emitting diodes that require direct current to operate effectively. In this paper, we demonstrate a proof-of-concept device that addresses this fundamental issue - a gallium nitride-based bidirectional light-emitting diode.

The dissociation of (a+c) misfit dislocations at the InGaN/GaN interface.

In hexagonal materials, (a+c) dislocations are typically observed to dissociate into partial dislocations. Edge (a+c) dislocations are introduced into (0001) nitride semiconductor layers by the process of plastic relaxation. As there is an increasing interest in obtaining relaxed InGaN buffer layers for the deposition of high In content structures, the study of the dissociation mechanism of misfit (a+c) dislocations laying at the InGaN/GaN interface is then crucial for understanding their nucleation and glide mechanisms.

Nanostars in Highly Si-Doped GaN.

Understanding the relation between surface morphology during epitaxy of GaN:Si and its electrical properties is important from both the fundamental and application perspectives. This work evidences the formation of nanostars in highly doped GaN:Si layers with doping level ranging from 5 × 10 to 1 × 10 cm grown by plasma-assisted molecular beam epitaxy (PAMBE). Nanostars are 50-nm-wide platelets arranged in six-fold symmetry around the [0001] axis and have different electrical properties from the surrounding layer.

Evidence for "dark charge" from photoluminescence measurements in wide InGaN quantum wells.

Wide (15-25 nm) InGaN/GaN quantum wells in LED structures were studied by time-resolved photoluminescence (PL) spectroscopy and compared with narrow (2.6 nm) wells in similar LED structures. Using below-barrier pulsed excitation in the microsecond range, we measured increase and decay of PL pulses.

Polarization Doping in a GaN-InN System-Ab Initio Simulation.

Polarization doping in a GaN-InN system with a graded composition layer was studied using ab initio simulations. The electric charge volume density in the graded concentration part was determined by spatial potential dependence. The emerging graded polarization charge was determined to show that it could be obtained from a polarization difference and the concentration slope.

Ion implantation of tunnel junction as a method for defining the aperture of III-nitride-based micro-light-emitting diodes.

We report on III-nitride-based micro-light-emitting diodes (µLEDs) operating at 450 nm wavelength with diameters down to 2 µm. Devices with a standard LED structure followed by a tunnel junction were grown by plasma-assisted molecular beam epitaxy. The emission size of µLEDs was defined by shallow He implantation of the tunnel junction region.

Role of Metallic Adlayer in Limiting Ge Incorporation into GaN.

Atomically thin metal adlayers are used as surfactants in semiconductor crystal growth. The role of the adlayer in the incorporation of dopants in GaN is completely unexplored, probably because n-type doping of GaN with Si is relatively straightforward and can be scaled up with available Si atomic flux in a wide range of dopant concentrations. However, a surprisingly different behavior of the Ge dopant is observed, and the presence of atomically thin gallium or an indium layer dramatically affects Ge incorporation, hindering the fabrication of GaN:Ge structures with abrupt doping profiles.

Electrically pumped blue laser diodes with nanoporous bottom cladding.

We demonstrate electrically pumped III-nitride edge-emitting laser diodes (LDs) with nanoporous bottom cladding grown by plasma-assisted molecular beam epitaxy on c-plane (0001) GaN. After the epitaxy of the LD structure, highly doped 350 nm thick GaN:Si cladding layer with Si concentration of 6·10 cm was electrochemically etched to obtain porosity of 15 ± 3% with pore size of 20 ± 9 nm. The devices with nanoporous bottom cladding are compared to the reference structures.

Dependence of InGaN Quantum Well Thickness on the Nature of Optical Transitions in LEDs.

The design of the active region is one of the most crucial problems to address in light emitting devices (LEDs) based on III-nitride, due to the spatial separation of carriers by the built-in polarization. Here, we studied radiative transitions in InGaN-based LEDs with various quantum well (QW) thicknesses-2.6, 6.

Quantum-confined Stark effect and mechanisms of its screening in InGaN/GaN light-emitting diodes with a tunnel junction.

Nitride-based light-emitting diodes (LEDs) are well known to suffer from a high built-in electric field in the quantum wells (QWs). In this paper we determined to what extent the electric field is screened by injected current. In our approach we used high pressure to study this evolution.

Distributed-feedback blue laser diode utilizing a tunnel junction grown by plasma-assisted molecular beam epitaxy.

In this paper, we demonstrate a novel approach utilizing tunnel junction (TJ) to realize GaN-based distributed feedback (DFB) laser diodes (LDs). Thanks to the use of the TJ the top metal contact is moved to the side of the ridge and the DFB grating is placed directly on top of the ridge. The high refractive index contrast between air and GaN, together with the high overlap of optical mode with the grating, provides a high coupling coefficient.

InGaN blue light emitting micro-diodes with current path defined by tunnel junction.

We have fabricated tunnel-junction InGaN micro-LEDs using plasma-assisted molecular beam epitaxy technology, with top-down processing on GaN substrates. Devices have diameters between 5 µm and 100 µm. All of the devices emit light at 450 nm at a driving current density of about 10.

Revealing inhomogeneous Si incorporation into GaN at the nanometer scale by electrochemical etching.

Typical methods of doping quantification are based on spectroscopy or conductivity measurements. The spatial dopant distribution assessment with nanometer-scale precision is limited usually to one or two dimensions. Here we demonstrate an approach to detect three-dimensional dopant homogeneity in GaN:Si layers using electrochemical etching (ECE).

Anomalous photocurrent in wide InGaN quantum wells.

We show that in a wide InGaN quantum well, placed within an undoped region of the pin diode, a photocurrent in the forward direction is observed. The photocurrent switches to reverse direction when the light intensity is increased and/or photon energy is above the bandgap of the quantum barrier. We propose a model showing that the anomalous photocurrent is due to the fact that when the carriers are pumped into the wide quantum well they cannot recombine until the built-in field is screened.

Stack of two III-nitride laser diodes interconnected by a tunnel junction.

We demonstrate a stack of two III-nitride laser diodes (LDs) interconnected by a tunnel junction grown by plasma-assisted molecular beam epitaxy. Hydrogen-free growth is used to obtain as-grown p-type conductivity essential for buried tunnel junctions (TJ). We show the impact of the design of tunnel junction.