Design and performance of EUV resist containing photoacid generator for sub-100 nm lithography.

To fulfill the SIA roadmap requirements for EUV resists, the development of entirely new polymer platforms is necessary. In order to address issues like Line Edge Roughness (LER) and photospeed, we have developed a novel chemically amplified photoresist containing a photoacid generator (PAG) in the main chain of the polymer. The incorporation of a cationic PAG unit, phenyl methacrylate dimethylsulfonium nonaflate (PAG), in the resist backbone showed increased sensitivity, when compared with analogous blend PAG resist samples.

Helical conformational specificity of enzymatically synthesized water-soluble conducting polyaniline nanocomposites.

A novel template guided enzymatic approach has been developed to synthesize optically active conducting polyaniline (PANI) nanocomposites in the presence of H2O2 as an oxidant, using (+) and (-) 10-camphorsulfonic acid (CSA) as a dopant and chiral inductor. The formation of chiral polyaniline in the nanocomposites was confirmed by circular dichroism (CD). Interestingly, the CD spectra of nanocomposites formed either with (+) or with (-) CSA show the enzyme itself plays a critical role in controlling the stereospecificity of the polyaniline (PANI) in the nanocomposite.