We report on the absorption of a 100nm thick hydrogenated amorphous silicon layer patterned as a planar photonic crystal (PPC), using laser holography and reactive ion etching. Compared to an unpatterned layer, electromagnetic simulation and optical measurements both show a 50% increase of the absorption over the 0.38-0.
View Article and Find Full Text PDFWe propose a design that increases significantly the absorption of a thin layer of absorbing material such as amorphous silicon. This is achieved by patterning a one-dimensional photonic crystal (1DPC) in this layer. Indeed, by coupling the incident light into slow Bloch modes of the 1DPC, we can control the photon lifetime and then, enhance the absorption integrated over the whole solar spectrum.
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