Extreme ultraviolet broadband imaging spectrometer using dispersion-matched zone plates.

We present simultaneous 1D imaging and broadband spectroscopy of a laser-produced plasma (LPP) source of extreme ultraviolet light, using a tapered zone plate that is matched to the dispersion of a transmission grating. We describe the design and fabrication of the zone plates in the 5-80 nm wavelength regime with designed spatial resolution of ∼10 µm and spectral resolution of ∼0.8 nm.

Influence of the Template Layer on the Structure and Ferroelectric Properties of PbZrTiO Films.

The microstructure of the PbZrTiO (PZT) films is known to influence the ferroelectric properties, but so far mainly the effect of the deposition conditions of the PZT has been investigated. To our knowledge, the influence of the underlying electrode layer and the mechanisms leading to changes in the PZT microstructure have not been explored. Using LaNiO (LNO) as the bottom electrode material, we investigated the evolution of the PZT microstructure and ferroelectric properties for changing LNO pulsed-laser deposition conditions.

Nanoscale piezoelectric surface modulation for adaptive extreme ultraviolet and soft x-ray optics.

Extreme ultraviolet and soft x-ray wavelengths have ever-increasing applications in photolithography, imaging, and spectroscopy. Adaptive schemes for wavefront correction at such a short wavelength range have recently gained much attention. In this Letter we report, to the best of our knowledge, the first demonstration of a functional actuator based on piezoelectric thin films.

Tuning of large piezoelectric response in nanosheet-buffered lead zirconate titanate films on glass substrates.

Renewed interest has been witnessed in utilizing the piezoelectric response of PbZrTiO (PZT) films on glass substrates for applications such as adaptive optics. Accordingly, new methodologies are being explored to grow well-oriented PZT thin films to harvest a large piezoelectric response. However, thin film piezoelectric response is significantly reduced compared to intrinsic response due to substrate induced clamping, even when films are well-oriented.

Wavefront correction in the extreme ultraviolet wavelength range using piezoelectric thin films.

A new scheme for wavefront correction in the extreme ultraviolet wavelength range is presented. The central feature of the scheme is the successful growth of crystalline piezoelectric thin films with the desired orientation on an amorphous glass substrate. The piezoelectric films show a high piezoelectric coefficient of 250 pm/V.

Spectral purification and infrared light recycling in extreme ultraviolet lithography sources.

We present the design of a novel collector mirror for laser produced plasma (LPP) light sources to be used in extreme ultraviolet (EUV) lithography. The design prevents undesired infrared (IR) drive laser light, reflected from the plasma, from reaching the exit of the light source. This results in a strong purification of the EUV light, while the reflected IR light becomes refocused into the plasma for enhancing the IR-to-EUV conversion.

Method to calculate the far field of three-dimensional objects for computer-generated holography.

Here, a new method for calculating the computer-generated holograms of three-dimensional (3D) objects is presented along with a review of current techniques. The method, the planar layers method (PLM), is established on the idea of representing 3D objects in discrete planar layers perpendicular to the observation plane, then calculating the total far field pattern by summing up the far field patterns of each layer. Simulation results, computational complexity, and error comparisons reveal that this new method can be used to calculate far field patterns--hence, the holograms--of computer-synthesized objects very efficiently.