A comparative study of the influence of the deposition technique (electrodeposition versus sputtering) on the properties of nanostructured FePd films.

Sputtering and electrodeposition are among the most widespread techniques for metallic thin film deposition. Since these techniques operate under different principles, the resulting films typically show different microstructures even when the chemical composition is kept fixed. In this work, films of FePd were produced in a thickness range between 30 and 600 nm, using both electrodeposition and sputtering.