Photoacoustic Characterization of TiO Thin-Films Deposited on Silicon Substrate Using Neural Networks.

In this paper, the possibility of determining the thermal, elastic and geometric characteristics of a thin TiO film deposited on a silicon substrate, with a thickness of 30 μm, in the frequency range of 20 to 20 kHz with neural networks were analysed. For this purpose, the geometric (thickness), thermal (thermal diffusivity, coefficient of linear expansion) and electronic parameters of substrates were known and constant in the two-layer model, while the following nano-layer thin-film parameters were changed: thickness, expansion and thermal diffusivity. Predictions of these three parameters of the thin-film were analysed separately with three neural networks.