Controlled deposition of nanoparticles with critical Casimir forces.

Nanocrystal assembly represents the key fabrication step to develop next-generation optoelectronic devices with properties defined from the bottom-up. Despite numerous efforts, our limited understanding of nanoscale interactions has so far delayed the establishment of assembly conditions leading to reproducible superstructure morphologies, therefore hampering integration with large-scale, industrial processes. In this work, we demonstrate the deposition of a layer of semiconductor nanocrystals on a flat and unpatterned silicon substrate as mediated by the interplay of critical Casimir attraction and electrostatic repulsion.