Multi-level single mode 2D polymer waveguide optical interconnects using nano-imprint lithography.

Single and multi-layer passive optical interconnects using single mode polymer waveguides are demonstrated using UV nano-imprint lithography. The fabrication tolerances associated with imprint lithography are investigated and we show a way to experimentally quantify a small variation in index contrast between core and cladding of fabricated devices. 1x2 splitting devices based on directional couplers and multimode interference interferometers are demonstrated to have less than 0.