Transparent (Ni,Au)/ZnO:Al-Based Ohmic Contacts to p-Type GaN as an Insight into the Role of Ni and Au in Standard p-Type GaN Contacts.

In this work, Ni/ZnO:Al and Au/ZnO:Al structures are proposed as efficient ohmic contacts to p-GaN. Through a careful selection of deposition parameters and annealing environment, we not only achieve the formation of high-quality ohmic contacts but also gain insights into the interfacial reactions, enhancing the understanding of conventional Ni/Au contact formation on p-GaN. In particular, the notion that the presence of NiO at the interface is enough for an ohmic contact to form is challenged by showing that in fact it has to be NiO formed at the interface from metallic Ni and additional oxygen.

Photocatalytic degradation of methylene blue at nanostructured ZnO thin films.

The photocatalytic degradation of the wastewater dye pollutant methylene blue (MB) at ZnO nanostructured porous thin films, deposited by direct current reactive magnetron sputtering on Si substrates, was studied. It was observed that over 4 photocatalytic cycles (0.3 mg · lMB solution, 540 minUV irradiation), the rate constantof MB degradation decreased by ∼50%, varying in the range (1.

Why conductivity is not always king - physical properties governing the capacitance of 2D metal-organic framework-based EDLC supercapacitor electrodes: a Ni(HITP) case study.

We report a systematic study on the variation of the physical properties of Ni(HITP) (HITP = 2,3,6,7,10,11-hexaiminotriphenylene) in the context of their influence on the capacitive behavior of this material in supercapacitor electrodes prepared using the neat MOF. We find that, for this representative material, the sample morphology has a greater impact on the measured electrode performance than differences in bulk electrical conductivity.

Surface Properties of Nanostructured, Porous ZnO Thin Films Prepared by Direct Current Reactive Magnetron Sputtering.

In this paper, the results of detailed X-ray photoelectron spectroscopy (XPS) studies combined with atomic force microscopy (AFM) investigation concerning the local surface chemistry and morphology of nanostructured ZnO thin films are presented. They have been deposited by direct current (DC) reactive magnetron sputtering under variable absolute Ar/O₂ flows (in sccm): 3:0.3; 8:0.