Publications by authors named "Michael E Swanwick"

Pacific Northwest National Laboratory (PNNL) staff developed the Radionuclide Aerosol Sampler Analyzer (RASA) for worldwide aerosol monitoring in the 1990s. Recently, researchers at PNNL and Creare, LLC, have investigated possibilities for how RASA could be improved, based on lessons learned from more than 15 years of continuous operation, including during the Fukushima Daiichi Nuclear Power Plant disaster. Key themes addressed in upgrade possibilities include having a modular approach to additional radionuclide measurements, optimizing the sampling/analyzing times to improve detection location capabilities, and reducing power consumption by using electrostatic collection versus classic filtration collection.

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Femtosecond ultrabright cathodes with spatially structured emission are a critical technology for applications such as free-electron lasers, tabletop coherent x-ray sources, and ultrafast imaging. In this work, the optimization of the total electron yield of ultrafast photon-triggered field emission cathodes composed of arrays of nanosharp, high-aspect-ratio, single-crystal silicon pillars is explored through the variation of the emitter pitch and height. Arrays of 6 nm tip radius silicon emitters with emitter densities between 1.

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Femtosecond ultrabright electron sources with spatially structured emission are an enabling technology for free-electron lasers, compact coherent X-ray sources, electron diffractive imaging, and attosecond science. In this work, we report the design, modeling, fabrication, and experimental characterization of a novel ultrafast optical field emission cathode comprised of a large (>100,000 tips), dense (4.6 million tips·cm(-2)), and highly uniform (<1 nm tip radius deviation) array of nanosharp high-aspect-ratio silicon columns.

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Two near-ultraviolet (UV) sensors based on solution-grown zinc oxide (ZnO) nanowires (NWs) which are only sensitive to photo-excitation at or below 400 nm wavelength have been fabricated and characterized. Both devices keep all processing steps, including nanowire growth, under 100 °C for compatibility with a wide variety of substrates. The first device type uses a single optical lithography step process to allow simultaneous in situ horizontal NW growth from solution and creation of symmetric ohmic contacts to the nanowires.

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