Phase separation in poly(tert-butyl acrylate)/polyhedral oligomeric silsesquioxane (POSS) thin film blends.

Phase separation in thin film blends of poly(tert-butyl acrylate) (PtBA) and a polyhedral oligomeric silsesquioxane (POSS), trisilanolphenyl-POSS (TPP), is studied as functions of annealing temperature and time, using reflected light optical microscopy, atomic force microscopy, and X-ray photoelectron spectroscopy. The results demonstrate that the PtBA/TPP blend system confined to thin films ( approximately 90 nm) exhibits lower critical solution temperature (LCST) behavior with a critical temperature of approximately 70 degrees C and a critical composition of 60 wt % PtBA with insignificant dewetting at the phase boundary. Off-critical spinodal behavior is observed for 58 and 62 wt % PtBA blend films.

Morphological evolution in dewetting polystyrene/polyhedral oligomeric silsesquioxane thin film bilayers.

Morphological evolution in dewetting thin film bilayers of polystyrene (PS) and a polyhedral oligomeric silsesquioxane (POSS), trisilanolphenyl-POSS (TPP), was studied as a function of annealing temperature and annealing time. The results demonstrate unique dewetting morphologies in PS/TPP bilayers at elevated temperatures that are significantly different from those typically observed in dewetting polymer/polymer bilayers. During temperature ramp studies by optical microscopy (OM) in the reflection mode, PS/TPP bilayers form cracks with a weak optical contrast at approximately 130 degrees C.