Blister test to measure the out-of-plane shear modulus of few-layer graphene.

We measure the out-of-plane shear modulus of few-layer graphene (FLG) by a blister test. During the test, we employed a monolayer molybdenum disulfide (MoS) membrane stacked onto FLG wells to facilitate the separation of FLG from the silicon oxide (SiO) substrate. Using the deflection profile of the blister, we determine an average shear modulus of 0.

Adhesion of 2D MoS to Graphite and Metal Substrates Measured by a Blister Test.

Using a blister test, we measured the work of separation between MoS membranes from metal, semiconductor, and graphite substrates. We found a work of separation ranging from 0.11 ± 0.