Thermal behavior of 1,2-dipalmitoyl-sn-3-phosphoglycerocholine bi- and multi-layers, deposited with physical vapor deposition under ellipsometric growth control.

1,2-dipalmitoyl-sn-3-phosphoglycerocholine membranes were deposited onto a silicon substrate (Si/SiO(2)) using physical vapor deposition with in situ ellipsometric thickness control. Along several heating cycles it was possible to identify well-defined boundaries for gel, ripple, liquid crystalline, and fluid-disordered phases. Particularly, the second order transition between gel and ripple phase was clearly identified in the range of ~28-34 °C using Raman spectroscopy.