Interferometric analysis of nanostructured surface profiles: correcting material-dependent phase shifts.

We present a technique to correct interferometry for the material-dependent phase shift that accompanies reflection. Such corrections are needed for nanometer accuracy of surfaces that are not of homogeneous composition. We adapt the general theory of reflection from surfaces in which there are irregular and unresolved areas of several materials to treat the specific case in which only two materials are present, as is the case for many practical applications.