Physical and electrochemical area determination of electrodeposited Ni, Co, and NiCo thin films.

The surface area of electrodeposited thin films of Ni, Co, and NiCo was evaluated using electrochemical double-layer capacitance, electrochemical area measurements using the [Ru(NH[Formula: see text])[Formula: see text]][Formula: see text]/[Ru(NH[Formula: see text])[Formula: see text]][Formula: see text] redox couple, and topographic atomic force microscopy (AFM) imaging. These three methods were compared to each other for each composition separately and for the entire set of samples regardless of composition. Double-layer capacitance measurements were found to be positively correlated to the roughness factors determined by AFM topography.