Preparation of Silicophosphate Alternating Hybrid Copolymers via Nonaqueous Acid-Base Reactions of Phosphoric Acid and Organo-Bridged Bis(chlorosilane).

A design of atomic and oligomer level structure in organic-inorganic hybrid materials is highly important for various applications. Nonaqueous acid-base reaction allows us to prepare silicophosphates with controlled inorganic networks (-(O-P-O-Si)) at atomic level because phosphorous and silicon-based precursors can react directly, resulting in an alternating copolymer network. Organic functionalization in those materials has been realized so far by using organic-modified phosphorous acid and/or organo-chlorosilane as precursors.