Publications by authors named "Masaki Hanzawa"
Organic photoresist coatings, primarily composed of resins, are commonly used in the electronics industry to protect inorganic underlayers. Conventional photoresist strippers, such as amine-type agents, have shown high removal performance but led to environmental impact and substrate corrosiveness. Therefore, this trade-off must be addressed.
View Article and Find Full Text PDFPhotoresist stripping is the final step in the photolithography process that forms fine patterns for electronic devices. Recently, a mixture of ethylene carbonate (EC) and propylene carbonate (PC) has attracted attention as a new stripper based on its eco-friendliness and anti-corrosiveness. However, the EC/PC mixture causes re-adsorption of the photoresist during a process of subsequent water rinsing.
View Article and Find Full Text PDFArticle Synopsis
- The study examines the adsorption of different lengths of triblock Pluronic surfactants on silica using atomic force microscopy in a solvent mixture of ethylene and propylene carbonates.
- The Pluronic surfactants vary in their poly(ethylene oxide) (PEO) chain lengths, influencing their solvophilic and solvophobic interactions, with longer PEO chains generally leading to stronger repulsive forces.
- The results indicated that the F-68 surfactant creates a polymer brush on the silica surface, while differences in stretching forces and pull-off distances were observed across the surfactants, particularly between L-62 and F-68.