Publications by authors named "Masafumi Horiuchi"

Atomic layer deposition (ALD) is capable of providing an ultrathin layer on high-aspect ratio structures with good conformality and tunable film properties. In this research, we modified the surface of ZnO nanowires through ALD for the fabrication of a ZnO/SiO2 (core/shell) nanowire microfluidic device which we utilized for the capture of CpG-rich single-stranded DNAs (ssDNA). Structural changes of the nanowires while varying the number of ALD cycles were evaluated by statistical analysis and their relationship with the capture efficiency was investigated.

View Article and Find Full Text PDF

A sparse ZnO nanowire array with aspect ratio of ca. 120 and growth rate of 1 μm/h was synthesized by controlling the density of seeds at the initial stage of nanowire growth. The spatially-separated nanowires were cut off from the growth substrate without breaking, and thus were useful in the construction of a single-nanowire device by photolithography.

View Article and Find Full Text PDF