Two Functions from a Single Photoresist: Tuning Microstructure Degradability from Light-Stabilized Dynamic Materials.

A photoresist-based on a light-stabilized dynamic material driven by an out-of-equilibrium photo-Diels-Alder reaction of triazolinediones with naphthalenes-whose ability to intrinsically degrade postprinting can be tuned by a simple adjustment of laser intensity during 3D laser lithography is introduced. The resist's ability to form stable networks under green light irradiation that degrade in the dark is transformed into a tunable degradable 3D printing material platform. In-depth characterization of the printed microstructures via atomic force microscopy before and during degradation reveals the high dependency of the final structures' properties on the writing parameters.

Visible-Light-Degradable 3D Microstructures in Aqueous Environments.

The additive manufacturing technique direct laser writing (DLW), also known as two-photon laser lithography, is becoming increasingly established as a technique capable of fabricating functional 3D microstructures. Recently, there has been an increasing effort to impart microstructures fabricated using DLW with advanced functionalities by introducing responsive chemical entities into the underpinning photoresists. Herein, a novel photoresist based on the photochemistry of the bimane group is introduced that can be degraded upon exposure to very mild conditions, requiring only water and visible light (λ  = 415-435 nm) irradiation.

Time-Dependent Differential and Integral Quantum Yields for Wavelength-Dependent [4+4] Photocycloadditions.

The [4+4] photocycloaddition of anthracene is one of most relevant photoreactions and is widely applied in materials science, as it allows to remote-control soft matter material properties by irradiation. However, highly energetic UV irradiation is commonly applied, which limits its application. Herein, the wavelength dependence of the photodimerization of anthracene is assessed for the first time, revealing that the reaction is induced just as effectively with mild visible light (410 nm).

Tailoring the Mechanical Properties of 3D Microstructures Using Visible Light Post-Manufacturing.

The photochemistry of anthracene, a new class of photoresist for direct laser writing, is used to enable visible-light-gated control over the mechanical properties of 3D microstructures post-manufacturing. The mechanical and viscoelastic properties (hardness, complex elastic modulus, and loss factor) of the microstructures are measured over the course of irradiation via dynamic mechanical analysis on the nanoscale. Irradiation of the microstructures leads to a strong hardening and stiffening effect due to the generation of additional crosslinks through the photodimerization of the anthracene functionalities.

Contemporary Photoligation Chemistry: The Visible Light Challenge.

Catalyst-free and bond-forming light-induced reactions have seen an unprecedented renaissance in the realm of soft matter materials science due to their efficiency, spatio-temporal controllability and, sometimes, photoreversible nature. However, many of these reactions rely on the application of high energy UV light that can cause photo-degradation and is inapplicable in biological environments. If up-conversion systems or two-photon processes are to be avoided, strategies for red-shifting catalyst-free ligation technology are critically required.