Control of Eu Oxidation State in YOS:Eu Thin-Film Phosphors Prepared by Atomic Layer Deposition: A Structural and Photoluminescence Study.

Structural and photoluminescence studies were carried out on Eu-doped YOS thin films grown by atomic layer deposition at 300 °C. (CHCp)Y, HO, and HS were used as yttrium, oxygen, and sulfur precursors, respectively, while Eu(thd) was used as the europium precursor. The Eu oxidation state was controlled during the growth process by following the Eu(thd) pulse with either a HS or O pulse.

Atomic Layer Deposition AlO Coatings Significantly Improve Thermal, Chemical, and Mechanical Stability of Anodic TiO Nanotube Layers.

We report on a very significant enhancement of the thermal, chemical, and mechanical stability of self-organized TiO nanotubes layers, provided by thin AlO coatings of different thicknesses prepared by atomic layer deposition (ALD). TiO nanotube layers coated with AlO coatings exhibit significantly improved thermal stability as illustrated by the preservation of the nanotubular structure upon annealing treatment at high temperatures (870 °C). In addition, a high anatase content is preserved in the nanotube layers against expectation of the total rutile conversion at such a high temperature.

Ytterbium-doped fibers fabricated with atomic layer deposition method.

We report on a new fabrication method of producing ytterbium doped fibers by atomic layer deposition (ALD) in combination with the conventional modified chemical vapor deposition (MCVD) technique. An MCVD soot-preform with a porous layer of SiO(2) is coated with layers of Yb(2)O(3) and Al(2)O(3) prior to sintering, using the gas-phase ALD method. An SEM/EDS material analysis study shows that the dopants successfully penetrate the full thickness of 320 µm of the soot layer.