Self-assembly of conductive Cu nanowires on Si(111)'5 × 5 '-Cu surface.

Upon room-temperature deposition onto a Cu/Si(111)'5 × 5' surface in ultra-high vacuum, Cu atoms migrate over extended distances to become trapped at the step edges, where they form Cu nanowires (NWs). The formed NWs are 20-80 nm wide, 1-3 nm high and characterized by a resistivity of ∼8 µΩ cm. The surface conductance of the NW array is anisotropic, with the conductivity along the NWs being about three times greater than that in the perpendicular direction.