ZnO Films Incorporation Study on Macroporous Silicon Structure.

In the present work, we developed hybrid nanostructures based on ZnO films deposited on macroporous silicon substrates using the sol-gel spin coating and ultrasonic spray pyrolysis (USP) techniques. The changes in the growth of ZnO films on macroporous silicon were studied using a UV-visible spectrometer, an X-ray diffractometer (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM). XRD analysis revealed the beneficial influence of macroporous silicon on the structural properties of ZnO films.

Porous Si-SiO based UV Microcavities.

Obtaining silicon-based photonic-structures in the ultraviolet range would expand the wavelength bandwidth of silicon technology, where it is normally forbidden. Herein, we fabricated porous silicon microcavities by electrochemical etching of alternating high and low refraction index layers; and were carefully subjected to two stages of dry oxidation at 350 °C for 30 minutes and 900 °C, with different oxidation times. In this way, we obtained oxidized porous silicon that induces a shift of a localized mode in the ultraviolet region.

Porous Si-SiO UV Microcavities to Modulate the Responsivity of a Broadband Photodetector.

Porous Si-SiO UV microcavities are used to modulate a broad responsivity photodetector (GVGR-T10GD) with a detection range from 300 to 510 nm. The UV microcavity filters modified the responsivity at short wavelengths, while in the visible range the filters only attenuated the responsivity. All microcavities had a localized mode close to 360 nm in the UV-A range, and this meant that porous Si-SiO filters cut off the photodetection range of the photodetector from 300 to 350 nm, where microcavities showed low transmission.