J Opt Soc Am A Opt Image Sci Vis
August 2018
The electric field at the output of an optical system is in general affected by both aberrations and diffraction. Many simulation techniques treat the two phenomena separately, using a geometrical propagator to calculate the effects of aberrations and a wave-optical propagator to simulate the effects of diffraction. We present a ray-based simulation method that accounts for the effects of both aberrations and diffraction within a single framework.
View Article and Find Full Text PDFWe present a method for simulating multiple diffraction in imaging systems based on the Huygens-Fresnel principle. The method accounts for the effects of both aberrations and diffraction and is entirely performed using Monte Carlo ray tracing. We compare the results of this method to those of reference simulations for field propagation through optical systems and for the calculation of point spread functions.
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