Publications by authors named "Maksim Yu Zhuk"
Article Synopsis
- The study investigates how a bottom TiO interfacial layer affects the ferroelectric properties of TiN/HfZrO/TiN capacitors, showing that adding this layer increases the polar orthorhombic phase in the HfZrO film.
- The thickness of the TiO layer significantly influences the crystalline structure of HfZrO, leading to a stabilization of the monoclinic phase at greater TiO thicknesses.
- While the TiO layer enhances retention performance by reducing oxygen vacancies and imprint effects, there are limitations in endurance due to phase transitions in the TiO layer when the effective electric field is increased.
