Mobility enhancement by Sb-mediated minimisation of stacking fault density in InAs nanowires grown on silicon.

We report the growth of InAs(1-x)Sb(x) nanowires (0 ≤ x ≤ 0.15) grown by catalyst-free molecular beam epitaxy on silicon (111) substrates. We observed a sharp decrease of stacking fault density in the InAs(1-x)Sb(x) nanowire crystal structure with increasing antimony content.

InAs(1-x)P(x) nanowires grown by catalyst-free molecular-beam epitaxy.

We report on the self-catalysed growth of vertical InAs(1-x)P(x) nanowires on Si(111) substrates by solid-source molecular-beam epitaxy. High-resolution transmission electron microscopy revealed the mixed wurtzite and zincblende structure of the nanowires. Energy dispersive x-ray spectroscopy and x-ray diffraction measurements were used to study the phosphorus content x in the InAs(1-x)P(x) nanowires, which was shown to be in the range 0-10 %.

Minimization of the contact resistance between InAs nanowires and metallic contacts.

We investigate different processes for optimizing the formation of Ohmic contacts to InAs nanowires. The nanowires are grown via molecular beam epitaxy without the use of metal catalysts. Metallic contacts are attached to the nanowires by using an electron beam lithography process.