Controllable optical emission spectroscopy diagnostic system for analysis of process chemistries.

Optical emission spectroscopy (OES) diagnostics have been employed for many years in plasma etch end point detection schemes. Unfortunately some newer process systems have much lower optical emission or limited optical access. To overcome such limitations, an OES diagnostic system making use of variable e-beam has been developed.

Understanding the synthesis of DEGVE pulsed plasmas for application to ultra thin biocompatible interfaces.

There is interest in the development of novel surface treatments for biocompatibility and non-fouling behaviors on various surfaces of in vivo devices. Polyethylene glycol thin films have shown promise as non-fouling passivation layers for such devices. Studies of the surface chemistry and non-fouling effectiveness of plasma deposited di(ethylene glycol) vinyl ether (DEGVE) films have observed that non-fouling performance is maximized when plasma deposition occurs at low values of average power, (<5W).

Durable diamond-like carbon templates for UV nanoimprint lithography.

The interaction between resist and template during the separation process after nanoimprint lithography (NIL) can cause the formation of defects and damage to the templates and resist patterns. To alleviate these problems, fluorinated self-assembled monolayers (F-SAMs, i.e.

Nitrogen atom energy distributions in a hollow-cathode planar sputtering magnetron.

Energy distributions of nitrogen atoms (N) in a hollow-cathode planar sputtering magnetron were obtained by use of optical emission spectroscopy. A characteristic line, N I 8216.3 A, well separated from molecular nitrogen emission bands, was identified.