The results of the investigation of the reflective characteristics of multilayer mirrors based on Ru/Y are presented. Reflection coefficients at the level of 38.5% at an operating wavelength of 9.
View Article and Find Full Text PDFIn this work, the refractive index of beryllium in the photon energy range 20.4-250 eV was experimentally determined. The initial data include measurements of the transmittance of two free-standing Be films with thicknesses of 70 nm and 152 nm, as well as reflectometric measurements of similar films on a substrate.
View Article and Find Full Text PDFA fabrication method comprising near-field holography (NFH) with an electron beam lithography (EBL)-written phase mask was developed to fabricate soft X-ray varied-line-spacing gratings (VLSGs). An EBL-written phase mask with an area of 52 mm × 30 mm and a central line density greater than 3000 lines mm was used. The introduction of the EBL-written phase mask substantially simplified the NFH optics for pattern transfer.
View Article and Find Full Text PDFA comparative study was carried out of the structure and reflection performance of four types of multilayer mirror for extreme ultraviolet lithography at 11.2 nm; these were a pure Mo/Be structure and three Mo/Be-based structures with thin BC, C and Si interlayers. It was demonstrated that Mo/Be mirrors show maximum reflectance at normal incidence, while maximum structural perfection is shown by Mo/Be/Si mirrors.
View Article and Find Full Text PDFThe He-II (λ=30.4 nm) emission line is one of the spectral channels chosen to study solar corona. This Letter reports on investigations of novel beryllium (Be)/magnesium multilayer coatings which, when incorporated beneath a protective bilayer of aluminium and Be, ensure particularly high-reflection coefficients of up to 56%, a spectral width of Δλ=1.
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