Publications by authors named "M G Sertsu"

The results of the investigation of the reflective characteristics of multilayer mirrors based on Ru/Y are presented. Reflection coefficients at the level of 38.5% at an operating wavelength of 9.

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In this work, the refractive index of beryllium in the photon energy range 20.4-250 eV was experimentally determined. The initial data include measurements of the transmittance of two free-standing Be films with thicknesses of 70 nm and 152 nm, as well as reflectometric measurements of similar films on a substrate.

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A fabrication method comprising near-field holography (NFH) with an electron beam lithography (EBL)-written phase mask was developed to fabricate soft X-ray varied-line-spacing gratings (VLSGs). An EBL-written phase mask with an area of 52 mm × 30 mm and a central line density greater than 3000 lines mm was used. The introduction of the EBL-written phase mask substantially simplified the NFH optics for pattern transfer.

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A comparative study was carried out of the structure and reflection performance of four types of multilayer mirror for extreme ultraviolet lithography at 11.2 nm; these were a pure Mo/Be structure and three Mo/Be-based structures with thin BC, C and Si interlayers. It was demonstrated that Mo/Be mirrors show maximum reflectance at normal incidence, while maximum structural perfection is shown by Mo/Be/Si mirrors.

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The He-II (λ=30.4  nm) emission line is one of the spectral channels chosen to study solar corona. This Letter reports on investigations of novel beryllium (Be)/magnesium multilayer coatings which, when incorporated beneath a protective bilayer of aluminium and Be, ensure particularly high-reflection coefficients of up to 56%, a spectral width of Δλ=1.

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