Covalent Patterning of 2D MoS.

The development of an efficient method to patterning 2D MoS into a desired topographic structure is of particular importance to bridge the way towards the ultimate device. Herein, we demonstrate a patterning strategy by combining the electron beam lithography with the surface covalent functionalization. This strategy allows us to generate delicate MoS ribbon patterns with a minimum feature size of 2 μm in a high throughput rate.