Position-controlled laser-induced creation of rutile TiO nanostructures.

For potential applications of nanostructures, control over their position is important. In this report, we introduce two continuous wave laser-based lithography techniques which allow texturing thin TiO films to create a fine rutile TiO structure on silicon via spatially confined oxidation or a solid-liquid-solid phase transition, for initial layers, we use titanium and anatase TiO, respectively. A frequency-doubled Nd:YAG laser at a wavelength of 532 nm is employed for the lithography process and the samples are characterized with scanning electron microscopy.

Thin-film filter wavelength-stabilized, grating combined, high-brightness kW-class direct diode laser.

We report on kW-class dense wavelength beam combining of a laser diode module consisting of ten broad-area laser diode bars by using a novel multi-laser cavity approach based on a thin-film filter (TFF) as a dispersive optical element. The wavelength-stabilized output of the TFF cavity is beam combined upon a -1 order transmission grating. Hereby, a cylindrical telescope is used for linear dispersion-matching between the TFF and the combiner grating.