Characterization of nanoscale gratings by spectroscopic reflectometry in the extreme ultraviolet with a stand-alone setup.

The authors present a study on the dimensional characterization of nanoscale line gratings by spectroscopic reflectometry in the extreme ultraviolet spectral range (5 nm to 20 nm wavelength). The investigated grating parameters include the line height, the line width, the sidewall angle and corner radii. The study demonstrates that the utilization of shorter wavelengths in state-of-the-art optical scatterometry provides a high sensitivity with respect to the geometrical dimensions of nanoscale gratings.

Spatially Resolved Spectroscopic Extreme Ultraviolet Reflectometry for Laboratory Applications.

Spatially resolved extreme ultraviolet reflectometry is presented in application to a local characterization of thin non-uniform contamination layers. Sample reflectivity mapping is performed, demonstrating high chemical sensitivity of the technique. Amorphous Al₂O₃ and carbon are determined as the contaminants of the studied silicon wafer.

Design of structured YAG:Ce scintillators with enhanced outcoupling for image detection in the extreme ultraviolet.

In this Letter, the authors present a design study on YAG:Ce scintillator plates with a microstructured and coated surface. The goal of the study is to improve the outcoupling efficiency and to optimize the directionality of the scintillation light with respect to indirect image detection in the extreme ultraviolet spectral range (5-50 nm wavelength). In a geometric optical simulation, a gain in outcoupling efficiency by over a factor of 4 is shown while the directionality of the scintillation light is improved with respect to state-of-the-art plane scintillator plates.