Publications by authors named "Luis Rodriguez-De Marcos"

A new procedure to measure the extinction coefficient k of film materials that are relatively transparent is presented. This procedure does not require the use of an optical-constant model or the knowledge of extra physical properties of the material, such as the specific heat capacity. It involves preparing a sample with two areas, at least one of them coated with the film, whereas the other may remain uncoated or may be coated with a different thickness of the same material.

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Imaging at H Ly-α (121.6 nm), among other spectral lines in the short far UV (FUV), is of high interest for astrophysics, solar, and atmosphere physics, since this spectral line is ubiquitously present in space observations. However, the lack of efficient narrowband coatings has mostly prevented such observations.

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Multilayer beamsplitter polarizers have been developed for improved solar polarimetry at key spectral lines. The advantage of beamsplitter polarizers is that a single device separates s from p polarization; this helps minimize attenuation and enables a more compact and lighter polarimeter, which is important for space instruments. Polarizers based on Al/AlF multilayers were prepared for both C IV (155 nm) and Mg II (280 nm) lines, and based on Al/MgF multilayers for H Lyman α line (121.

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Adachi proposed a procedure to avoid divergences in optical-constant models by slightly shifting photon energies to complex numbers on the real part of the complex dielectric function, ε1. The imaginary part, ε2, was ignored in that shift and, despite this, the shifted function would also provide ε2 (in addition to ε1) in the limit of real energies. The procedure has been successful to model many materials and material groups, even though it has been applied phenomenologically, i.

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Article Synopsis
  • Thick absorber layers in EUV photomasks negatively affect pattern quality in photolithography, necessitating the development of new materials with improved absorption.
  • This study focuses on the optical properties of Tellurium (Te) and Tellurium Oxide (TeO) films in the 13-14 nm range, exploring their effectiveness as potential replacements for current absorbers, TaN and TaBN.
  • The results indicate that Te and TeO can achieve significantly lower reflectivity at 13.5 nm, with Te showing a reflectivity of about 0.7% at a thickness of 32.4 nm, outperforming traditional materials.
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Optical-constant data of a material typically come from various sources, which may result in inconsistent data. Sum rules are tests to evaluate the self-consistency of optical constant data sets. Standard sum rules provide collective self-consistency evaluation of an optical-constant set in the full electromagnetic spectrum, but they give no information on the specific spectral range originating the inconsistency.

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Tauc-Lorentz model is commonly used to describe the dielectric constant of amorphous semiconductors as a function of few parameters. However, this model is not fully analytic and presents other mathematical shortcomings. A modified self-consistent model based on the integration of [E'-(E + ia)]-1 functions using Tauc-Lorentz`s ε2 expression as a weight function is presented.

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The low expected absorption of Ca in the extreme ultraviolet (EUV) makes it an attractive material for multilayers and filters because most materials in nature strongly absorb the EUV. Few optical constant data had been reported for Ca. In this research, Ca films of various thicknesses were deposited on grid-supported C films and their transmittance measured in situ from the visible to the soft x-rays.

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We have developed new, Mg/SiC multilayer coatings with corrosion barriers which can be used to efficiently and simultaneously reflect extreme ultraviolet (EUV) radiation in single or multiple narrow bands centered at wavelengths in the spectral region from 25 to 80 nm. Corrosion mitigation was attempted through the use of Al-Mg or Al thin layers. Three different multilayer design concepts were developed and deposited by magnetron sputtering and the reflectance was measured at near-normal incidence in a broad spectral range.

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The optical constants of ion-beam-sputtered B₄C films have been measured by ellipsometry in the 190-950 nm range. The set of data has been extended toward both shorter and longer wavelengths with data in the literature, along with interpolations and extrapolations, in order to obtain a self-consistent set of data by means of Kramers-Krönig analysis. All data correspond to films that were deposited by sputtering on nonheated substrates, and hence they are expected to be amorphous.

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The optical constants of ion-beam-sputtered SiC films have been measured by ellipsometry in the 190 to 950 nm range. The set of data has been extended both toward shorter and longer wavelengths with data in the literature, along with inter- and extrapolations, in order to obtain a self-consistent set of data by means of Kramers-Krönig analysis. All data correspond to films that were deposited by sputtering on nonheated substrates, and hence they are expected to be amorphous.

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