Removal of sulfamethoxazole, sulfadiazine, and sulfamethazine by UV radiation and HO and SO radicals using a response surface model and DFT calculations.

In this work, the degradation of sulfamethazine (SMT), sulfadiazine (SMD), and sulfamethoxazole (SMX) by using UV light, UV/HO, and UV/SO was analyzed. Direct photolysis was studied by varying the lamp power and the solution pH. DFT calculations were carried out to corroborate the efficiency of the degradation as a function of the solution pH.