Critical pattern selection method for full-chip source and mask optimization.

Source and mask optimization (SMO) is one of the most important resolution enhancement techniques for integrated circuit manufacturing in 2X nm technology node and beyond. Nowadays full-chip SMO is alternatively realized by applying SMO to limited number of selected critical patterns instead of to full-chip area, since it is too computational expensive to be apply SMO in full-chip area directly. The critical patterns are selected by a pattern selection method which enables SMO in full-chip application by balancing the performance and computation consumption.