A Single-Step Route to Single-Crystal Molybdenum Disulphide (MoS) Monolayer domains.

We report a simple, single-cycle synthetic method for forming highly-crystalline, micron-sized monolayer domains of phase-pure MoS. This method combines liquid chemistry with discrete, layer-by-layer deposition from a novel Mo precursor. Single-crystalline MoS with domain sizes up to 100 μm have been obtained and characterised by optical and electron microscopy as well as Raman and photoluminescence spectroscopy.

Correction: Atomic layer deposition of a MoS2 film.

Correction for 'Atomic layer deposition of a MoS2 film' by Lee Kheng Tan et al., Nanoscale, 2014, 6, 10584-10588.

Atomic layer deposition of a MoS₂ film.

A mono- to multilayer thick MoS₂ film has been grown by using the atomic layer deposition (ALD) technique at 300 °C on a sapphire wafer. ALD provides precise control of the MoS₂ film thickness due to pulsed introduction of the reactants and self-limiting reactions of MoCl₅ and H₂S. A post-deposition annealing of the ALD-deposited monolayer film improves the crystallinity of the film, which is evident from the presence of triangle-shaped crystals that exhibit strong photoluminescence in the visible range.

Transparent, well-aligned TiO(2) nanotube arrays with controllable dimensions on glass substrates for photocatalytic applications.

Transparent, well-aligned TiO(2) nanotube arrays (NTAs) with controllable dimensions are grown on glass substrates via atomic layer deposition (ALD) of TiO(2) onto free-standing porous anodic alumina (PAA) templates. Photodegradation of aqueous methylene blue (MB) solution and solid stearic acid (SA) film using TiO(2) NTAs of various wall thicknesses are investigated. The Pd functionalized TiO(2) NTAs, with a wall thickness of 15 nm and height of 200 nm, has the highest photodegradation efficiency at 76% after 4 h of UV irradiation.