Measurement setup to simultaneously explore the location and energy of trapped charges in thin polymer films.

This research proposes a unique system that combines charge density measurements by the laser intensity modulation method with optically excited current acquisitions using the photo-stimulated discharge technique (PSD). The purpose of this setup is to investigate the relationship between space charge properties (such as density, spatial depth, and time evolution) and the photocurrent-associated energies in order to gain new insights into the trap population and detrapping mechanisms in thin polymer films. This paper presents a description of the technical principles of both methods as well as the whole combined system.

Influence of dielectric layer thickness on charge injection, accumulation and transport phenomena in thin silicon oxynitride layers: a nanoscale study.

Charge injection and retention in thin dielectric layers remain critical issues due to the great number of failure mechanisms they inflict. Achieving a better understanding and control of charge injection, trapping and transport phenomena in thin dielectric films is of high priority aiming at increasing lifetime and improving reliability of dielectric parts in electronic and electrical devices. Thermal silica is an excellent dielectric but for many of the current technological developments more flexible processes are required for synthesizing high quality dielectric materials such as amorphous silicon oxynitride layers using plasma methods.

Methodology for extraction of space charge density profiles at nanoscale from Kelvin probe force microscopy measurements.

To understand the physical phenomena occurring at metal/dielectric interfaces, determination of the charge density profile at nanoscale is crucial. To deal with this issue, charges were injected applying a DC voltage on lateral Al-electrodes embedded in a SiN thin dielectric layer. The surface potential induced by the injected charges was probed by Kelvin probe force microscopy (KPFM).

Charge injection in thin dielectric layers by atomic force microscopy: influence of geometry and material work function of the AFM tip on the injection process.

Charge injection and retention in thin dielectric layers remain critical issues for the reliability of many electronic devices because of their association with a large number of failure mechanisms. To overcome this drawback, a deep understanding of the mechanisms leading to charge injection close to the injection area is needed. Even though the charge injection is extensively studied and reported in the literature to characterize the charge storage capability of dielectric materials, questions about charge injection mechanisms when using atomic force microscopy (AFM) remain open.