Utilizing Zirconium MOF-functionalized Fiber Substrates Prepared by Molecular Layer Deposition for Toxic Gas Capture and Chemical Warfare Agent Degradation.

Metal-organic frameworks (MOFs) are a class of porous organic-inorganic solids extensively explored for numerous applications owing to their catalytic activity and high surface area. In this work MOF thin films deposited in a one-step, molecular layer deposition (MLD), an all-gas-phase process, on glass wool fibers are characterized by X-ray diffraction, Fourier transform infrared spectroscopy, scanning electron microscopy, and their capabilities towards toxic industrial chemical (TIC) capture and chemical warfare agents (CWA) degradation are investigated. It is shown that despite low volume of the active material used, MOFs thin films are capable of removal of harmful gaseous chemicals from air stream and CWA from neutral aqueous environment.

Exploring bioimpendance instrumentation for the characterization of open tubular liquid chromatography columns.

Open tubular liquid chromatography columns with organic polymer layers can be powerful tools for high sensitivity measurements in e.g. proteomics.

All-gas-phase synthesis of amino-functionalized UiO-66 thin films.

Thin films of metal-organic frameworks (MOFs) prepared using all-gas-phase techniques such as atomic/molecular layer deposition (ALD/MLD) are emerging due to their potential for enabling suitable applications. Their high and specific porosity enables their use as membranes for separations and as a basis for sensors in microelectronics, provided that films can be made. The properties of such MOF materials can be tuned by choosing linker molecules that are functionalized with a variety of chemical groups.

All-gas-phase synthesis of UiO-66 through modulated atomic layer deposition.

Thin films of stable metal-organic frameworks (MOFs) such as UiO-66 have enormous application potential, for instance in microelectronics. However, all-gas-phase deposition techniques are currently not available for such MOFs. We here report on thin-film deposition of the thermally and chemically stable UiO-66 in an all-gas-phase process by the aid of atomic layer deposition (ALD).