The paper focuses on the dual high-power impulse magnetron sputtering of TiAlN coatings using short pulses of high power delivered to the target. The surface morphology, elemental composition, phase composition, hardness, wear resistance, and adhesive strength of TiAlN coatings with different Al contents were investigated on WC-Co substrates. The heat resistance of the TiAlN coating was determined with synchrotron X-ray diffraction.
View Article and Find Full Text PDFThe paper deals with the (CrAl)N coating containing 17 to 54 % Al which is deposited on AISI 430 stainless steel stationary substrates by short-pulse high-power dual magnetron sputtering of Al and Cr targets. The Al/Cr ratio in the coating depends on the substrate position relative to magnetrons. It is shown that the higher Al content in the (CrAl)N coating improves its hardness from 17 to 28 GPa.
View Article and Find Full Text PDFThe article deals with the plasma-assisted chemical vapor deposition of 0.3-1.4 μm thick a-C:H:SiO films in a mixture of argon and polyphenylmethylsiloxane vapor onto the Ti-6Al-4V alloy substrate, which is often used as an implant material.
View Article and Find Full Text PDFThis paper focuses mainly on the in vitro study of a five-week biodegradation of a-C:H:SiO films of different thickness, obtained by plasma-assisted chemical vapor deposition onto Ti-6Al-4V alloy substrate using its pulsed bipolar biasing. In vitro immersion of a-C:H:SiO films in a solution of 0.9% NaCl was used.
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