Publications by authors named "Kirstin E Schauble"
Article Synopsis
- * A novel plasma-enhanced atomic layer deposition (PEALD) process enhances the uniform growth of dielectrics on MoS, resulting in better electrical performance compared to traditional methods.
- * The study demonstrates that PEALD allows for the creation of ultrathin high-κ dielectric films (down to ~3.5 nm) on MoS, leading to improved device stability and features without compromising electrical quality.