Fabrication of TiO2 memristive arrays by step and flash imprint lithography.

Identical patterns and characteristics of sub-100 nm TiO2-based memristive systems on 4 inch silicon substrates were demonstrated using Step and flash imprint lithography (SFIL). SFIL is a nanoimprint lithography technique that offers the advantagess of a high aspect-ratio, reliable nano-patterns, and a transparent stamp that can be used to facilitate overlay techniques. The overlay process from the alignment system in IMPRIO 100 was appropriate for the fabrication of nanoscale crossbar arrays in this study.

Pattern-definable and low cost fabrication of nanopatterned conducting polymer film on flexible substrates.

This study reports the pattern definable and low cost fabrication of nanopatterned conducting polymer film on flexible substrates. Noble nanopatterned polymer hard template was fabricated by using nanoimprint lithography (NIL) and used for electropolymerization of conducting polymer. Conducting polymer was electrochemically deposited on the template and transferred over to flexible substrates.

An Antireflective Nanostructure Array Fabricated by Nanosilver Colloidal Lithography on a Silicon Substrate.

An alternative method is presented for fabricating an antireflective nanostructure array using nanosilver colloidal lithography. Spin coating was used to produce the multilayered silver nanoparticles, which grew by self-assembly and were transformed into randomly distributed nanosilver islands through the thermodynamic action of dewetting and Oswald ripening. The average size and coverage rate of the islands increased with concentration in the range of 50-90 nm and 40-65%, respectively.

Mass fabrication of resistive random access crossbar arrays by step and flash imprint lithography.

Step and flash imprint lithography (SFIL) is a promising method recently used for next generation lithographic technology because it is a high-speed process that can be carried out at room temperature and low pressures. Improvements made to SFIL enable the replication of crossbar patterns with a high resolution and the development of suitable materials and techniques to achieve high resolution capability. In this study, SFIL is used to fabricate high-density random access crossbar arrays based on a NiO resistive switching system.

Measurement of surface adhesion force of adhesion promoter and release layer for UV-nanoimprint lithography.

In this work, we investigated the effect of surface treatment as release layer and adhesion promoter for UV-Nanoimprint lithography and measured the surface adhesion force by using tensile separation force of Instron equipment. Several Self-Assembled Monolayers (SAMs) of 3-Acryloxypropyl methyl dichlorosilane (APMDS) 3-Aminopropyl-triethoxysilane (APTS), and 3-Glycidoxypropyltrimethoxysilane (GPTS) as adhesion promoters and (1H,1H,2H,2H-perfluorooctyl)trichlorosilane (FOTS) as release layer were fabricated by vapor deposition method and were compared with oxygen plasma treatment. APMDS could strongly improve the adhesion force between UV-curable acrylate resin and silicon substrate because of strong covalent bonding.

Stamping-based planarization of flexible substrate for low-pressure UV nanoimprint lithography.

Patterning flexible substrates in nano scale is an important and challenging issue in the fabrication of next-generation devices based on a non-silicon substrate. Step and Flash imprint lithography (S-FIL) which is a room temperature and low pressure process offers several important advantages, such as the use of a smaller and therefore cheaper stamp or the possibility of the overlay imprinting, as a transparent stamp is utilized. However, it is very difficult to perform S-FIL on a flexible substrate successfully due to the high waviness.

Boron nitride stamp for ultra-violet nanoimprinting lithography fabricated by focused ion beam lithography.

Cubic boron nitride (c-BN) is one of the hardest known materials (second after diamond). It has a high level of chemical resistance and high UV transmittance. In this study, a stamp for ultra-violet nanoimprint lithography (UV-NIL) was fabricated using a bi-layered BN film deposited on a quartz substrate.

A mushroom lectin from ascomycete Cordyceps militaris.

A mushroom lectin has been purified from ascomycete Cordyceps militaris, which is one of the most popular mushrooms in eastern Asia used as a nutraceutical and in traditional Chinese medicine. This lectin, designated CML, exhibited hemagglutination activity in mouse and rat erythrocytes, but not in human ABO erythrocytes. SDS-PAGE of CML revealed a single band with a molecular mass of 31.

Fabrication of nano- and micro-scale UV imprint stamp using diamond-like carbon coating technology.

Two-dimensional (2-D) and three-dimensional (3-D) diamond-like carbon (DLC) stamps for ultraviolet nanoimprint lithography were fabricated with two methods: namely, a DLC coating process, followed by focused ion beam lithography; and two-photon polymerization patterning, followed by nanoscale-thick DLC coating. We used focused ion beam lithography to fabricate 70 nm deep lines with a width of 100 nm, as well as 70 nm deep lines with a width of 150 nm, on 100 nm thick DLC layers coated on quartz substrates. We also used two-photon polymerization patterning and a DLC coating process to successfully fabricate 200 nm wide lines, as well as 3-D rings with a diameter of 1.