Fabrication of Flexible and Re-entrant Liquid-Superrepellent Surface Using Proximity and PNIPAM-Assisted Soft Lithography.

The nature-inspired flexible and re-entrant liquid-superrepellent surface has attracted significant attention due to its excellent superomniphobic performance against low-surface-tension liquids. Although conventional photolithography and molding methods offer the advantage of large-area manufacturing, they often involve multiple double-sided alignment and exposure steps, resulting in complex procedures with long processing cycles. In this study, we proposed a straightforward single-exposure ultraviolet proximity lithography method for re-entrant liquid-superrepellent surface fabrication using a photomask with a coaxial circular aperture and ring.