Publications by authors named "Kazumasa Okamoto"

The imaging reactions of resist materials used for nano-patterning have become radiation-chemical reactions, with the shortening of wavelengths of the exposure light sources in lithography systems. The most widely used patterning materials in industrial lithography are chemically amplified resists (CAR). Understanding the deprotonation mechanism of ionized polymers (radical cations) is important for acid generation in CARs.

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Organic-inorganic lead halide perovskite solar cells (PSCs) are highly efficient, flexible, lightweight, and even tolerant to radiation, such as protons, electron beams (EB), and γ-rays, all of which makes them plausible candidates for use in space satellites and spacecrafts. However, the mechanisms of radiation damage of each component of PSC [an organic hole transport material (HTM), a perovskite layer, and an electron transport material (ETM)] are not yet fully understood. Herein, we investigated the EB irradiation effect (100 keV, up to 2.

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Dimer radical ions of aromatic molecules in which excess charge is localized in a pair of rings have been extensively investigated. While dimer radical cations of aromatics have been previously produced in the condensed phase, the number of molecules that form dimer anions is very limited. In this study, we report the formation of intramolecular dimer radical ions (cations and anions) of diphenyl sulfone derivatives (DPs) by electron beam pulse radiolysis in the liquid phase at room temperature.

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An air-segmentation approach has been introduced to a feedback-based and subsequent fixed triangular wave-controlled flow ratiometry to suppress axial dispersion in flow titration. The flow rate of a base solution containing an indicator is linearly varied with a control signal, V, supplied by a computer. The solution is merged with an acid solution under a constant total flow rate.

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A monogalactosyl diacylglyceride (MGDG) was isolated as an antiviral component from Coccomyxa sp. KJ (IPOD FERM BP-22254) via bioassay-guided fractionation. α-Linolenic acid (C18:3) and 7,10,13-hexadecatrienoic acid (C16:3) accounted for approximately 72% and 23%, respectively, of the MGDG total fatty acids of the MGDG.

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Recently, metal oxide nanocrystallites have been synthesized through a new pathway, i.e., the submerged photosynthesis of crystallites (SPSC), and flower-like ZnO nanostructures have been successfully fabricated via this method.

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Fluorination of resist materials is an effective method used to enhance the energy deposition of extreme ultraviolet (EUV) light in the fabrication of next-generation semiconductor devices. The dynamics of radical ions are important to understand when considering the radiation-chemistry of the resist materials using EUV and electron beam lithography. Here, the dynamics of the radical anions and cations of benzenes with one or two 2-hydroxyhexafluoroisopropyl groups (HFABs) were studied using radiolysis techniques.

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We report the fabrication of flower-like CuO nanostructured surfaces via submerged photo-synthesis of crystallites (SPSC), which requires only UV illumination in neutral water. In this paper, we discuss the reaction mechanism of the photochemical formation of the SPSC-fabricated CuO nanostructures in detail based on surface microstructural analyses and a radiation-chemical consideration with additional gamma-ray irradiation. Since the SPSC method for surface nanostructural fabrication can work at low temperatures at atmospheric pressure without using harmful substances, it is a potential fabrication method for green nanotechnology applications.

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We report a new production pathway for a variety of metal oxide nanocrystallites via submerged illumination in water: submerged photosynthesis of crystallites (SPSC). Similar to the growth of green plants by photosynthesis, nanocrystallites shaped as nanoflowers and nanorods are hereby shown to grow at the protruded surfaces via illumination in pure, neutral water. The process is photocatalytic, accompanied with hydroxyl radical generation via water splitting; hydrogen gas is generated in some cases, which indicates potential for application in green technologies.

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Aryl fluoride has attracted much attention as a resist component for extreme ultraviolet (EUV) lithography, because of the high absorption cross section of fluorine for EUV photons; however, less is known about electron attachment to fluorobenzene (FBz) and the stability of the reduced state. Picosecond and nanosecond pulse radiolysis of tetrahydrofuran solutions of FBz from mono-, di-, tri-, tetra-, penta-, and hexafluorobenzene was performed, and the effects of isomeric structure and number of fluorine atoms were examined. Scavenging of solvated electrons was found to correlate with the electron affinity obtained by density functional theory in the gas phase, whereas the decay of FBz radical anions was dominated by the activation energy of fluorine anion dissociation calculated using a polarized continuum model (PCM).

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Poly(4-hydroxystyrene) (PHS) has been used in lithography as a backbone polymer and is also a promising material for extreme-ultraviolet or electron beam lithography. The dynamics of PHS radical cations generated upon exposure to electron beam were investigated. The transient absorption of PHS was observed in the near-infrared region in p-dioxane solutions by pulse radiolysis.

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Dimer and trimer radical cations of benzene, toluene, and xylenes were produced selectively after gamma-irradiation in low-temperature 2-methylpentane matrices with electron scavengers: oxygen (O(2)) and sec-butyl chloride (sec-BuCl). The charge resonance (CR) band of the trimer radical cation (M(3)(+)) produced via the corresponding dimer radical cation (M(2)(+)) is clearly seen in the solution containing O(2) as the temperature increases over a range from 80 to 90 K. In o-xylene solution, a fairly strong and distinct M(3)(+) CR absorption is observed; this is due to the large M(3)(+)/M(2)(+) relative extinction coefficient.

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Laser-induced and matrix-free desorption/ionization on various submicrometer structures was investigated. First, to examine the effect of surface roughness on ionization, a silicon wafer or stainless steel was scratched with sandpaper. The fluences of a 337-nm nitrogen laser, required for ionization of synthetic polymers and reserpine, were markedly reduced on the scratched stainless steel or silicon as compared to the corresponding untreated surface.

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