Publications by authors named "Kasikov A"

The development of new encapsulating coatings for flexible solar cells (SCs) can help address the complex problem of the short lifespan of these devices, as well as optimize the technological process of their production. In this study, new laminate-type protective composite coatings were prepared using a silicon oxynitride thin-film matrix obtained by curing the pre-ceramic polymer perhydropolysilazane (PHPS) through two low-temperature methods: (i) thermal annealing at 180 °C and (ii) exposure to UV radiation at wavelengths of 185 and 254 nm. Single-walled carbon nanotubes (SWCNTs) were used as fillers via dry transfer, facilitating their horizontal orientation within the matrix.

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Axial resolution is one of the most important characteristics of a microscope. In all microscopes, a high axial resolution is desired in order to discriminate information efficiently along the longitudinal direction. However, when studying thick samples that do not contain laterally overlapping information, a low axial resolution is desirable, as information from multiple planes can be recorded simultaneously from a single camera shot instead of plane-by-plane mechanical refocusing.

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CrO thin films were grown on a Si (1 0 0) substrate using Cr(thd) and O by atomic layer deposition (ALD) at substrate temperatures () from 200 to 300 °C. X-ray amorphous films were deposited at a ≤ 225 °C, whereas at higher temperatures ( ≥ 250 °C), the eskolaite phase was observed in the films. The growth rate of the films increased from 0.

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SiO films were grown to thicknesses below 15 nm by ozone-assisted atomic layer deposition. The graphene was a chemical vapor deposited on copper foil and transferred wet-chemically to the SiO films. On the top of the graphene layer, either continuous HfO or SiO films were grown by plasma-assisted atomic layer deposition or by electron beam evaporation, respectively.

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HfO and FeO thin films and laminated stacks were grown by atomic layer deposition at 350 °C from hafnium tetrachloride, ferrocene, and ozone. Nonlinear, saturating, and hysteretic magnetization was recorded in the films. Magnetization was expectedly dominated by increasing the content of FeO.

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Crystal structure and electrical properties of hafnium-praseodymium oxide thin films grown by atomic layer deposition on ruthenium substrate electrodes were characterized and compared with those of undoped HfO films. The HfO reference films crystallized in the stable monoclinic phase of HfO. Mixing HfO and PrO resulted in the growth of nanocrystalline metastable tetragonal HfO.

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Thin solid films consisting of ZrO and FeO were grown by atomic layer deposition (ALD) at 400 °C. Metastable phases of ZrO were stabilized by FeO doping. The number of alternating ZrO and FeO deposition cycles were varied in order to achieve films with different cation ratios.

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Identification covered a source of dust deposits in snow on stationary monitoring sites near the largest in Europe copper-nickel enterprise <>. Retrospective analysis demonstrated that considerable decrease in aerotechnogenic load resulted in disappeared technogenic phase of the dust releases, but revealed influence of neighbouring heating power station using fuel oil.

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Article Synopsis
  • The study examines the topography and leakage current behaviors of TiO2 films created through atomic layer deposition on RuO2 electrodes, using either TiCl4 or Ti(O-i-C3H7)4 as precursors.
  • For both types of films, the leakage current is primarily concentrated in elevated grain areas rather than along the grain boundaries.
  • It was found that the TiCl4-based films exhibit a higher and more localized leakage current compared to those based on Ti(O-i-C3H7)4, with both films maintaining a similar physical thickness of about 20 nm.
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An electrochemical study of Au electrodes electrografted with azobenzene (AB), Fast Garnet GBC (GBC) and Fast Black K (FBK) diazonium compounds is presented. Electrochemical quartz crystal microbalance, ellipsometry and atomic force microscopy investigations reveal the formation of multilayer films. The elemental composition of the aryl layers is examined by X-ray photoelectron spectroscopy.

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